Tokyo Electron to Begin Accepting Orders for Triase+™ EX-II™ TiON
Simultaneously as Lam Research launches Fluorine free Tungsten for 3DNAND and DRAM, Tokyo Electron is launching their newset version of the market leading TiN Trias Tool that has been dominated the TiN...
View ArticleEuro CVD & Baltic ALD 2017 Exhibition in Sweden will sell out!
The Exhibition at EuroCVD & BalticALD 2017 in Sweden will sell out! Please take the chance to join ALD Lab Saxony as an Exhibitor at this main European ALD & CVD event in 2017. CVD-ALD bonanza...
View ArticlePssst ALD-Fest will be taking place also this year in Dresden!
Pssst #ALDFest will be taking place also this year in Dresden even that SEMICON Europa is in Grenoble this year. Most probably we will also this year book "Brauhaus am Waldschlösschen"This will be a...
View ArticleTokyo Electron - A spacer-on-spacer scheme for self-aligned multiple...
Tokyo Electron showcase "A spacer-on-spacer scheme for self-aligned multiple patterning and integration" using ALD which is claimed to be a "novel, low-cost spacer-on-spacer pitch-splitting approach is...
View ArticleModularflow launches mini ALD reactor with integrated QCM
Modularflow has launched a new mini ALD reactor with integrated Quartz Crystal Microbalance (QCM) to be used in R&D for processing small 1 inch coupon based substrates or by using the double sided...
View ArticleInvited Speakers for China ALD 2016 Announced
Following the successes of the previous two international Conferences on ALD Applications and China ALD Conferences since 2010, the 3rd International Conference on ALD Applications & 2016 China ALD...
View ArticleALD Lab Saxony auf der ALD2016 in Dublin, Irland
Unter inhaltlicher Leitung von Herrn Dr. Simon Elliott (Tyndall National Institute) und Herrn Dr. Jonas Sundqvist (Lund University & Fraunhofer IKTS) fand die weltgrößte ALD Konferenz dieses Jahr...
View ArticleTransparent Conductive Oxide Nanocrystals Coated with Insulators by ALD
Here is an interesting paper on transparent conductive oxide (TCO) nanocrystals coated by ALD Department of Energy, St. Louis and University of Texas at Austin, USA. As stated in teh paper, it has...
View ArticleWhat Transistors Will Look Like At 5nm by Mark LaPedus
As finFETs run out of steam after 7nm, what comes next? The debate is just beginning.August 18th, 2016 - By: Mark LaPedus, Semiconductor EngineeringChipmakers are currently ramping up 16nm/14nm finFET...
View ArticleAalto University Finland produces large-area thermoelectric nanostructures by...
Here is an interesting ALD energy application by Aalto University researchers published in Nanotechweb and in Nanotechnology (abstract below): Nanotechnology offers a potential route towards improved...
View ArticleEntegris launch Fluorine-Free Tungsten (FFW) for 3D NAND
At the resent "4th Annual Yield Breakfast Forum: Yield Enhancement Challenges in Today’s Memory IC Production" Jim O’Neill from Entegris presented "Fluorine-Free Tungsten (FFW) for 3D NAND" (SEMICON...
View ArticleVideo Tour of the Lam Research Dr. Richard A. Gottscho Laboratory
Lam Research Dr. Richard A. Gottscho Laboratory their "newest research and development facility is complete". The lab is part of their Fremont, CA campus. I especially like the nice view from the...
View ArticleKEMSTREAM to exhibit at Euro CVD - Baltic ALD 11-14th of June 2017 in...
Vi are very happy for KEMSTREAM taking part in the exhibition at Euro CVD - Baltic ALD 11-14th of June 2017 in Linköping Sweden! If your company is interested in exhibiting please get in contact with...
View ArticlePicosun joins A*STAR Cost-Effective Interposer Consortim in Singapore
ESPOO, Finland, 30th August, 2016 – Picosun Oy, the leading supplier of advanced Atomic Layer Deposition (ALD) manufacturing solutions, partners with A*STAR’s Institute of Microelectronics (IME) in...
View ArticleUltra-High Aspect Ratio InP Junctionless FinFETs by a Novel Wet Etching Method
Readers of this blog may have noticed that I got a new hobby and that I´ve been looking into some etching (ALE) on the side. Here is some interesting new results in etching InP Fins for future CMOS by...
View ArticleNCD to deliver Lucida GD series ALD system for OLED encapsulation with...
NCD reports today (8/31 2016) :The OLED market is going to prospect fast gigantic growing in the near future because OLED has the possibilities of bending, folding and various forms like circle,...
View ArticleRASIRC Renews Funding for Atomic Layer Deposition Research at University of...
RASIRC renewed its funding agreement with the University of California, San Diego (UCSD) for on-going semiconductor processing research. Professor Andrew Kummel of the Department of Chemistry...
View ArticleDARPA Researchers Develop Novel Method for Room-Temperature ALD
Successful deposition of silicon and gallium nitride at low temperature could allow three-dimensional control of thin films and integration of previously incompatible microelectronics...
View ArticleSandia ALD bubble membrane can capture CO2 and reduce emissions efficiently
(Nanowerk News) Sandia National Laboratories and the University of New Mexico (UNM) have created a powerful new way to capture carbon dioxide from coal- and gas-fired electricity plants with a...
View ArticleUS and Korean Researchers Making pristine graphene in a microwave oven
Nanotechweb.org reports : Researchers at Rutgers University in the US and UNIST in Korea have succeeded in producing high-quality graphene by simply zapping graphene oxide with microwaves for 1–2...
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