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Oxford Instruments and das-nano demonstrate non-destructive wafer based...
Commonly titanium nitride (TiN) thickness and resistivity wafer fab in-line metrology is based on ellipsometry and 4-point probe resistivity mapping. Alternative and relatively slower or more complex...
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Picosun Oy shows record growth in ALD for fiscal year 2016/2017
Picosun is one of the leading suppliers of ALD thin film deposition technology for semiconductor, lightning, MEMS as well as for other industries and research. This week I had the chance to meet with...
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According to Amnesty Industry giants fail to tackle child labour allegations...
According to Amnesty International, major electronics and electric vehicle companies are still not doing enough to stop human rights abuses entering their cobalt supply chains, almost two years after...
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Beneq present ALD Throughput Revolution in More than Moore Markets
At Semicon Europa, the largest microelectronics event in Europe, 14-17, November, Munich, Germany, Beneq launched the Beneq C-Series, a new Cluster-Compatible ALD product family for high-volume...
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Thermal atomic layer deposition of tungsten carbide films from WCl6 and TMA
Kyle J. Blakeney and Prof Winter from Department of Chemistry, Wayne State University just published a new exciting ALD path to tungsten carbide. WCl6 has favorable precursor characteristics and...
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Arradiance and InRedox team up to offer ALD Functionalized Nanomaterials
SUDBURY, Mass., Nov. 17, 2017 —Arradiance’s formidable Atomic Layer Deposition (ALD) foundry service and InRedox’s world-class manufacturing of nanoporous anodic aluminum oxide (AAO) and nanotubular...
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Aixtron complete sale of ALD/CVD memory product line to Eugene Technology
AIXTRON SE (FSE: AIXA), one of the world’s leading providers of deposition equipment to the semiconductor industry, announced today that the sale of AIXTRON’s ALD and CVD memory product line to Eugene...
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Atomic Layer Etching is entering HVM for sub 14 nm Logic
After years in R&D, several fab tool vendors last year finally began to ship systems based a next-generation technology called atomic layer etch (ALE).ALE is is moving into 16/14nm, but it will...
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Annual High-k Workshop 2018 goes on excursion to Wroclaw Poland
This coming year the classic Dresden NaMLab annual High-k Workshop 2018 organized by Dr. Uwe Schröder (ALD2012, Co-Chair) will make an excursion to Wroclaw Poland. The webpage just came online so...
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ALD assisted Nano-Architected capacitors
Nanotechweb.org reports: Researchers at Gwangju Institute of Science and Technology (GIST) Korea and California Institute of Technology USA have made low-k dielectric by a new technique. They deposit a...
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The 7nm race by TSMC and Samsung - EUV or not EUV
According to industry sources on October 19, Samsung Electronics is considering a plan to purchase 10 extreme ultraviolet (EUV) lithography tools from the Netherlands-based ASML, the biggest...
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Picosun provide ALD Cluster Tool to Swedish MEMS Foundry Silex Microsystems
ESPOO, Finland, 29th November, 2017 – Picosun Oy (Finland), Silex Microsystems AB (Sweden), and Pegasus Chemicals Ltd (UK) have joined forces to develop and provide novel ALD (Atomic Layer Deposition)...
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Transparent flexible capacitors by ALD high-k, ALD AZO and graphene electrodes
Transparent and flexible flat panel displays manufactured on plastic substrates and flexible substrates involve key technologies like ALD manufacturing of transparent electrodes and barriers. In...
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2nd HERALD.ECI Workshop in Barcelona March 1-2, 2018
The main objective of this 2nd HERALD.ECI Workshop with hands-on training is to create an ignition point for competitive proposals resulting in joint, EU-funded research projectsunder ECI (early career...
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Atomic Layer Processing for free!
Journal of Vacuum Science & Technology is More than VacuumRecent Atomic Layer Processing Articles Submit Your Articles on Atomic Layer Processing to JVST The following articles are free to...
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Picosun Oy and Ushio Inc. start collaboration in Japan
ESPOO, Finland, and TOKYO, Japan, 6th December, 2017 – Picosun Oy, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, and Ushio Inc., a leading manufacturer of...
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Globalfoundrfies to use quad patterning and Cobalt contacts for 7nm
ZDNet reports: At IEDM Globalfoundries presented details of its 7nm process which promises a significant increase in density, performance and efficiency in comparison to the 14nm technology used to...
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Ultrahigh Elastic Strain Energy Storage in Metal-Oxide-Infiltrated Patterned...
Phys.org reports: A team of scientists from the U.S. Department of Energy's Brookhaven National Laboratory and the University of Connecticut have developed a customizable nanomaterial that combines...
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ALD Lab Saxony Symposium at Semicon Europa 2017
The ALD Lab Saxony just held its annual Symposium at SEMICON Europe in Munich, Germany. Prof. Bartha, Dr. Jonas Sundqvist, Dr. Martin Knaut and Dr. Christoph Hossbach have been organizing the event...
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Amtech Announces Follow-On Order for Next Generation Solar ALD for PERC Cell...
TEMPE, Ariz., Dec. 14, 2017 /PRNewswire/ -- Amtech Systems, Inc. (NASDAQ: ASYS), a global supplier of production equipment and related supplies for the solar, semiconductor, and LED markets, today...
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