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TECHCET Critical Materials Reports(TM) and Market Briefs on CVD & ALD

TECHCET CA LLC is an advisory services firm focused on materials supply-chain market analysis and technologies for electronic device markets. Now integrated with the Critical Material Council (CMC),...

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Coventor - N7 FinFET Self-Aligned Quadruple Patterning Modeling

Coventor just released a white paper for ther modelling on FinFET Self-Aligned Quadruple Patterning for the 7nm node (N7).You can request the paper for download here: LINKWhite Paper : N7 FinFET...

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Argonne scientists create new oil-resistant filter technology

Argonne reports a novel new way to keep oil from clogging filters and equipment using ALD coated mabranes.Crude oil is sticky stuff and often clogs filters membranes and other equipment used in the oil...

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ALD/MLD reactor design and precursor delivery Tutorial by Paul Poodt

Dr. Paul Poodt from TNO, Netherlands, presenting ALD/MLD reactor consepts and design at the "Hybrid nanocoatings through molecular layer deposition" workshop held on August 27th - August 29th, 2018,...

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Video Online - HYCOAT Workshop "Hybrid nanocoatings through molecular layer...

Here is a fantastic set of ALD Tutorials & Presentations available on YouTube from a recent HYCOAT event at Ghent University, Belgium August 27-29, 2018 - HYCOAT Workshop "Hybrid nanocoatings...

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Estimating rising demand for Ru thin-films in the next generation chips

STREM Chemicals offers one of the most promising ruthenium amidinate precursors for growing Ru ALD or CVD filmsThe saturation of Moore’s curve while following systematic downscaling of logic and memory...

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JVSTA Call for Paper - Atomic Layer Deposition and Atomic Layer Etching

Manuscript Deadline: November 1, 2018This special topic collection is planned in collaboration with ALD 2018 and the ALE 2018 Workshop to be held in Incheon, South Korea during July 29—August 1, 2018....

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Welcome To The World's First Open ALD Blog Platform: BALD Engineering Guest Blog

Are you willing to get recognition and attention in the ALD community? Do you hold ALD news, articles, presentations, podcasts, videos, conference/workshop/tutorial invitation or promotion in your...

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AP Systems to supply Thin Film Encapsulation to Samsung Display QD-OLED line

DIGITimes China reports [LINK] that Samsung Display is building a large-scale quantum dot organic light-emitting diode (QD-OLED) panel pilot production line. The line is scheduled to be finished in...

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LIST invites you to the EuroCVD 22 – Baltic ALD 16 | 2019 conference in...

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Foundry investment in 5nm has started according to ASM

Here are some take aways form the ASM International Earnings Call for Q3/2018 [Full transcript by Seeking Alpa, LINK]. Interestingly there was no talk about "The end of Moore´s Law" at all. On the...

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Review Article - ALD for oxide semiconductor thin film transistors

Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development Jiazhen Sheng, Jung-Hoon Lee, Wan-Ho Choi, TaeHyun Hong, MinJung Kim, and...

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La 4ème édition du colloque RAFALD aura lieu du mardi 6 au jeudi 8 novembre...

La 4ème édition du colloque RAFALD aura lieu du mardi 6 au jeudi 8 novembre 2018 à Lyon.1ère édition de l'école d'automne de l'ALD le mardi 6 novembre matinCe workshop dédié à la technologie ALD (Dépôt...

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Beneq to present new automated wafer batch ALD platform at Semicon Europa

Beneq is presenting their new automated wafer batch ALD platform Beneq C2 at Semicon Europa in Munich November 13 to 16, 2108.[From Beneq News Letter] Come and visit us in Semicon Europa and hear all...

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Imec to present Highest-Density 3DS Stacked FinFETs at IEDM 2018

Here is an interesting paper to be presented by Imec at the upcoming IEDM 2018 in San Fransisco. Imec has managed to stack the complete FinFET front end module on top of a "standard" bulk silicon...

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RASIRC : Effective Silicon and Metal Nitride Deposition at Reduced Temperature

[RASIRC Technical Brief] Silicon and metal nitrides are extensively used in the semiconductor industry in logic and memory chip manufacturing. PEALD approaches have found success in this area but carry...

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Introductory lecture on ALD available as "Panopto" lecture capture, and...

Introductory lecture on ALD available as "Panopto" lecture capture, and slides in SlideShare by Prof. Riikka Puurunen, Aalto University, Finland.SlideShare : LINKPanopto Open Teaching Video : LINK

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Coverage, Composition and Band Gap Analysis of ALD-Grown Ultra Thin Films

[AZO Network News E-mail] Analyzing and developing ultra-thin film materials requires multiple data points typically from multiple instruments and techniques. Find out how one surface analysis...

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Samsung will give insights to their 3nm CMOS technology at IEDM2018

The 64th IEDM conference will be held December 1-5, 2018 in San Francisco (LINK). This year Samsung will give insights to their 3nm CMOS technology that will feature the so calle gate-all-around (GAA)...

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Imec to present scaled Superduper High-k Ruthenium/Strontium titanate...

Here is another interesting IEDM 2018 paper from Imec. It is a classical paper obn DRAM capacitor scaling featuring the almost impossible Superduper High-k Ruthenium/Strontium titanate capacitor! It is...

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