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AtomicLimits launch picture database for Atomic Level Processing
AtomicLimits Now serving the community with an image library of Atomic Scale Processing (ALD, ALE etc.) and its applications - A large and expanding set of free to use high quality images generated at...
View ArticleHigh-quality HfS2 2D-material by ALD at 100°C
A high-quality 2D-material by #ALDep at 100°C! Yuanyuan's very systematic and complete study of the well-behaved surface chemistry performed in collaboration with 7 other groups @FAU_Germany is...
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Chipmetrics Oy commercialises 3D test chip for ALD developed by VTT
The PillarHall test chip for analysing 3D thin film structures is ready for market. Chipmetrics Oy, a spin-off of VTT, is now starting to commercialise the solution. The test chip enables the...
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ALD to take over more and more as CVD and spin-on processes no longer are...
EE Times reports [LINK] about the recently announced Striker FE from Lam Research, an enhanced atomic layer deposition (ALD) platform addresses semiconductor manufacturing challenges for 3D NAND as...
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MSS Corp Low temp ALD the solution for analyzing extreme ultraviolet photoresist
MSS launches new materials analysis items: "ALD sample preparation" for 5nm ~ 2nm EUV PR & Low-k materialsMSS launches new materials analysis items: "ALD sample preparation" for 5nm ~ 2nm EUV...
View Article[PALD] SUMMIT Video Library is now available on demand - Enjoy!
The 2nd [PALD] Summit by Forge Nano is now happening. This is following the first very successful event earlier in 200 and Forge Nano is planning yet a 3rd event i summer 2021. More information will...
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ALD Webinar - The Ultimate Anti-Corrosion Coating Solution presented by Beneq
Join this webinar featuring ALD (atomic layer deposition) pioneer Beneq to learn about the unique benefits of ALD for critical chamber components with complex geometry, and how the technology offers...
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KLA Introduces Two New Systems that Take On Semiconductor Manufacturing's...
MILPITAS, Calif., Dec. 10, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced two new products: the PWG5™ wafer geometry system and the Surfscan® SP7XP wafer defect inspection system....
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Imec introduces 2D materials in the logic device scaling roadmap
[IEDM 2020 Virtual, Imec Belgium LINK] At the 2020 IEDM conference, imec proposes that 2D semiconductors like tungsten disulfide (WS2) can further extend the logic transistor scaling roadmap. The team...
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Beneq completes new clean room facility
The new ISO 7 cleanroom will be dedicated to manufacturing ALD equipment for semiconductor and other markets with similar cleanroom requirements. The new Espoo, Finland facility includes a 350 m2 ISO 7...
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Low Resistivity Titanium Nitride Thin Films ALD realized by RASIRC Brute®...
TiN ALD is one of the most important ALD processes in high volume manufacturing in the semiconductor industry for more than 15 years. Most Tier 1 ALD equipment manufacturers (e.g. ASM International,...
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EU Signs €145bn Declaration to Develop Next Gen Processors and 2nm Technology
Hey listen up ALD, Santa is coming - A lot of EU funds coming in bringing Europe back in the leading edge Semiconductor game. Thank you Matthieu Weber for sharing these wonderful news in these bad...
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Nanexa AB signs USD 3 million Investment Agreement with Applied Materials to...
Nanexa AB (publ) today announced that the company has entered into an investment agreement with Applied Ventures, LLC, the venture capital arm of Applied Materials, Inc., whereby Applied Ventures...
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Prodrive Technologies launch Bias generator with shaped waveform for Atomic...
Prodrive Technologies (LINK) introduces its disruptive tailored bias waveform generator to provide direct control of the sheath ion energy distribution in plasma processing. The tailored waveform...
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Imec demonstrate BEOL compatible architecture that paves the way to...
LEUVEN (Belgium), 15 December 2020— This week, at the 2020 International Electron Devices Meeting, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies,...
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The 200 mm Wafer Processing Equipment market is surging - who´s there fore ALD?
According to a report by Mark Lapedus (Semiconductor Engineering) there is a surge in demand for various chips is causing shortages for select 200mm foundry capacity as well as 200mm fab equipment, and...
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Nanoscale lithography of metal–organic frameworks (MOFs)
Here we have it, probably the most beautiful Journal Cover 2021 for the coming cover of the January 2021 issue of Nature Materials, by researchers from KU Leuven in Belgium, TU Munich, Vrije...
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Surface ligand removal in atomic layer deposition of GaN using triethylgallium
Here is a paper with really impressive results on Low Temperature GaN ALD using ABC-type pulsed sequence from Henrik Pedersen group Linköping University - They insert a step between triethylgallium and...
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How ALD can be used to stack 2D materials on one another at a nanometer scale
TU Eindhoven latest publication to see how the toolbox of ALD can be used to stack various layered 2D materials on one another at a nanometer scale.
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