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Awards at ALD / ALE 2019, Incheon South Korea
Congratulations - The ALD Innovator award “For Original Work and Leadership in ALD” was given to Prof. Hyungjun Kim at School of Electrical and Electronic Engineering at Yonsei University (LINK). Today...
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Entegris White Paper - Entegris Silicon Precursor Toolbox for Low-temperature...
Integris has published a white paper on low temperature silicon precursors:[Introduction] The drive toward making electronics faster, denser, and cheaper continues unabated. Shrinking device dimensions...
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Veeco Firebird(TM) - Batch Thermal ALD for High Volume Production
Earlier this year Veeco launched their new platform for Batch ALD for high volume production and now you can find more details on the Veeco product offering pages: LINKFirebird - Batch ALD for High...
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Meaglow Introduces its Hollow Cathode Plasma Sources to Four New Countries
While ALD2018 was going on in Incheon, South Korea, the first Meaglow hollow cathode plasma source in South Korea was being installed at Hanyang University in Ansan. This is one of a number of firsts...
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Is the semiconductor industry preparing for ruthenium again?
As cobalt is being implemented for 10/7 nm logic interconnects, the next contender on roadmaps for the leading IDMs and foundries is ruthenium. This is not the first time that ruthenium comes into...
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Virtual Issue: In Honor of Professor Markku Leskelä
This virtual issue celebrates Professor Markku Leskelä (University of Helsinki, Finland) and his decades-long career in the field of Atomic Layer Deposition (ALD). Prof. Leskelä has been the most...
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VEECO GEN10 AUTOMATED MBE CLUSTER SYSTEM WINS MAX PLANCK INSTITUTE TENDER,...
PLAINVIEW, N.Y., August 14, 2018—Veeco Instruments Inc. (NASDAQ: VECO) today announced that a dual chamber GEN10™ automated molecular beam epitaxy (MBE) cluster system won the tender offer by the Max...
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NaMLab present advances in ferroelectric HZO layers for low-power electronics
Recent results by NaMLab in Dresden Germanz, show a strong potential for further aggressive thickness reduction of HZO layers for low-power electronics. Genuinely ferroelectric sub-1-volt-switchable...
View ArticleJVST A: Flexible CIGS Solar Cells using Atomic layer Deposition
I remember testing the laboratory-scale rotary spatial-ALD reactor from this innovative at TNO in Eindhoven team lead by Paul Poodt and Fred Roozeboom some years ago and was very impressed then that it...
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NCD to supply a repeat order of Lucida GS Series for Hyundai Heavy Industry...
Korean ALD equipment manufacturer NCD reports repeat order for Al2O3 ALD passivation from Hyundai Heavy Industry Green Energy. "NCD has recently contracted with HHIGE to supply solar cell manufacture...
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SAVE THE DATE - EFDS ALD For Industry 2019 March 19-20 in Berlin, Germany
ALD for Industry - Tutorial, Workshop & ExhibitionThis event provides the opportunity to learn more about fundamentals of ALD technology, to get informed about recent progress in the field and to...
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Overview of Applied Materials cobalt metallization for local interconnects
For those of you interested in the details behind the Applied Materials integrated cobalt metallization process Jonathan Bakke has written two informative blogs about it in Semiconductror...
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Tyndall National Institute present the first computational study of thermal...
Modeling the Chemical Mechanism of the Thermal Atomic Layer Etch of Aluminum Oxide: A Density Functional Theory Study of Reactions during HF ExposureSuresh Kondati Natarajan and Simon D. ElliottTyndall...
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The Luxembourg Institute of Science and Technology (LIST) will organize the...
The Luxembourg Institute of Science and Technology (LIST) will organize the EuroCVD 22 - Baltic ALD 16 from 24 to 28 June 2019 in Luxembourg. Chemical Vapor deposition (CVD) and Atomic Layer Deposition...
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The Swedish Catalysis Society presented the prize to Professor Puurunen in...
[Aalto School of Chemical Engineering News] The Berzelius Medal is given in the honour of the famous Swedish researcher Berzelius. The prize winner has to be aged under 45 years, female every second...
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Stress-free ALD High-k from Picosun
ESPOO, Finland, 28th August, 2018– Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, reports a method to control and eliminate stress in ALD...
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JVSTA Call for Research Articles - Atomic Layer Deposition and Atomic Layer...
This special topic collection is planned in collaboration with ALD 2018 and the ALE 2018 Workshop to be held in Incheon, South Korea during July 29—August 1, 2018. The Special Topic Collection will...
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How to split nanowires by Atomic Layer Etching
The master thesis by Sabbir A. Khan based on work completed at Lund Nano Lab, Lund University Sweden, has finally been released from secrecy [Patent application WO2017157902A1]. Please find below the...
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Announcing Kronos™ 1080 and ICOS™ F160 Inspection Systems: Expanding...
KLA-Tencor has announced it is expanding its integrated circuit (IC) packaging portfolio with two new defect inspection products designed to address a wide variety of IC packaging challenges: KronosTM...
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