Clik here to view.
Advanced Materials Special Issue dedicated to current research activities on...
This Special Issue is dedicated to current research activities on Materials Science in Finland (LINK), providing a collection of outstanding contributions from diverse research groups on the recent...
View ArticleClik here to view.
Cobalt and Ruthnium confirmed in Intel 10nm Cannon Lake BEOL
TechInsights has found the long-awaited Cannon Lake - the Intel 10 nm logic process inside the i3-8121U CPU, used in the Lenovo IdeaPad330. This innovation boasts the following: Logic transistor...
View ArticleClik here to view.
HERALD SUMMIT 2018 25-28 September Barga Portugal - Open for registrations
Registration to HERALD SUMMIT 2018 is open. The HERALD Summit will be the premier European conference in 2018 devoted solely to atomic level processing, covering atomic layer deposition (ALD), atomic...
View ArticleClik here to view.
Plasma ALD and ALE Tutorial at PSE 2018, 16th of September in...
Plasma ALD and ALE Tutorial will be given at the 16th International Conference on Plasma Surface Engineering, September 17 - 21, 2018, in Garmisch-Partenkirchen, Germany. Sunday, September 16, 2018The...
View ArticleClik here to view.
Atomic Layer Deposition of platinum thin films - current and future applications
Strem Chemicals is a well-established (since 1964) supplier of ALD and CVD precursors for both R&D and industrial applications. Many of their compounds are also available in electronic grade...
View ArticleClik here to view.
Delft Univeristy of Technology orders Veeco PEALD system
PLAINVIEW, New York, June 26, 2018 – Veeco Instruments Inc. (Nasdaq: VECO) today announced that the Materials for Energy Conversion and Storage Group (MECS) at Delft University of Technology has...
View ArticleClik here to view.
Picosun storms over the Asian ALD production market in several key...
ESPOO, Finland, 28th June, 2018– Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, breaks through into industrial production in Asia in several...
View ArticleClik here to view.
Tutorial Plasma assisted atomic level processing – PEALD & ALE at PSE2018
Plasma assisted atomic level processing – PEALD & ALE , Sunday, September 16, 2018 The focus will be on atomic level processing technologies, such as Plasma Enhanced Atomic Layer Deposition (PEALD)...
View ArticleClik here to view.
ALD/CVD Precursors Market Reaches $1.3B by 2023
SAN DIEGO, July 6, 2018 /PRNewswire-iReach/ -- TECHCET—the advisory services firm providing electronic materials information— announced that strong growth in IC fabrication demand for atomic-layer...
View ArticleHERALD SUMMIT 2018 Extended Deadline abstract submission for poster presentation
Extended Deadline for abstract submission for poster presentation - 27th July 2018.https://www.european-ald.net/events/herald-summit-2018
View ArticleASM launch ALD Pulsar and PEALD Emerald on XP8 multi-chamber platform
New System Integrates Core Pulsar® and EmerALD® Capabilities with Higher Productivity, Enabled by Multi-Chamber 300mm XP8 PlatformSAN FRANCISCO, California - ASM International N.V. (Euronext Amsterdam:...
View ArticlePicosun - The ALD Company
While waiting for the ALD2018 in Korea starting you should have a look at the new Picosun promotional video. You can see a number of cool ALD reactors passing by in the background.
View ArticleClik here to view.
SVC TechCon 2019 Long Beach California has a new session for Atomic Layer...
The SVC has added a session entitled Emerging Technologies and Plasma Processes Focused on Atomic Layer Processes to its 2019 TechCon in Long Beach, California (LINK).Joint Session of Emerging...
View ArticleClik here to view.
Picosun’s ALD solutions make quality watches tick
ESPOO, Finland, 26th July, 2018 – Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, solidifies its position in the watchmaking market with repeat...
View ArticleClik here to view.
RASIRC low temperature ALD of silicon and metal nitrides
Silicon and metal nitrides are extensively used in the semiconductor industry in manufacturing of logic and memory chips that you will find in all smartphones, laptops, PCs and internet servers as well...
View ArticleClik here to view.
Gelest Announced Diiodosilane Commercialization for PEALD Silicon Nitride
MORRISVILLE, Pa., July 27, 2018 — Semiconductor material Gelest Inc. has announced the commercializing of diiodosilane to meet the global demand of the semiconductor industry for next-generation...
View ArticleClik here to view.
ALD equipment manufacturers tweets at ALD 2018
This year, the ALD conference (ALD 2018) took place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea. The ALD conference did again incorporate the Atomic Layer...
View ArticleClik here to view.
Overview of In situ Studies of ALD Processes & Reaction Mechanisms
Roger Bosch and Prof. Kessels from TU Eindhoven just recently published a fantastic blog post on Atomic Limits covering the Tutorial “In situ Studies of ALD Processes & Reaction Mechanisms” that...
View ArticleClik here to view.
Beneq present how to minimize circuit board maintenance with ALD
ALD for moisture protectionWherever we have electronics, we have circuit boards (CB). The ever-increasing demand for higher performance of electronics in more demanding environmental conditions is...
View ArticleClik here to view.
AVS ALD 2019 / ALE 2019 to be held in Bellevue, Washington, USA
As announced at ALD 2018 in South Korea just recently, Prof. Sumit Agarwal (Colorado School of Mines) and Dennis Hausmann (Lam Research) will be the Chairs of the next year AVS ALD Conference July...
View Article