High customer satisfaction with Picosun’s new service and support model
ESPOO, Finland, 31st August 2020 – Picosun Group’s growth strategy is based on strong expansion into industrial ALD markets. To support this strategy, special emphasis has been placed on strengthening...
View ArticleEpiluvac from Sweden launch MOCVD - ALD Combo reactors for Wide Band Gap Epi...
Epiluvac from Sweden has extended it offer for 200 mm Sic and GaN Wide Band Gap (WBG) Epitaxy reactors for SiC and GaN to include also ALD process mode. This is very impressive since there are very few...
View ArticleALD is now set up as a strong candidate to realise ALD indium nitride based...
Research from Linköping University in Sweden headed by Prof. Henrik Pedersen paves the way for ALD is now set up as a strong candidate to realise ALD indium nitride based electronics. Direct epitaxial...
View ArticleTechInsights’ Memory Process: 3D NAND Word Line Pad webinar
TechInsights’ ‘Memory Process: 3D NAND Word Line Pad‘ #webinar compares 9x-layer 3D NAND devices from major manufacturers and discusses the process sequence with emphasis on the word line pad (WLP)....
View ArticleBeneq ALD for Power Devices
Atomic Layer Deposition (ALD) provides damage-free surface preparation, and is capable of depositing a variety of high-k dielectric layers with excellent step coverage and quality. Beneq ALD provides...
View ArticleCMC 2020 anounce sevreal new speakers from Semiconductor Fabs!
The Critical Materials Council and its annual Conference CMC headed by TECHCET is Semiconductor Fab centric and we are happy to announce many speakers from the Fabs this year (21-22 October):- 4...
View ArticleImpacts of the US-China trade conflict on the semiconductor equipment market...
Here is an interesting review article (Seeking Alpha, LINK) covering the trade war between the US and China and the implications on the semiconductor wafer equipment market and the leading OEMs in the...
View ArticleCall for papers - JVSTA Special Issue on Area-Selective Deposition
As announced by Prof. Kessels: The Journal of Vacuum Science & Technology A is collecting manuscripts to be published in the Special Issue on Area-Selective Deposition. The deadline is September...
View ArticleIntermolecular - Inherently Ferroelectric Films by ALD Using ZrD-04 and HfD-04
Intermolecular, now part of MERCK, is updateing their R&D research/news blog on regular basis. Here is recent (ALD2020) presentaion on the results of Vijay Kris Narasimhan's research that provide a...
View ArticleJVST A | Special Collection: Atomic Layer Deposition and Atomic Layer Etching...
The Journal of Vacuum Science and Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition and Atomic Layer Etching. These special topic...
View ArticleProcess Power: The New Lithography - Advanced Energy
Here is a very insightful article by PETER GILLESPIE, VP & GM, Semiconductor Products, Advanced Energy Industries on the progress of Plasma RF Generators and Matching Networks. The article looks at...
View ArticleArea-Selective ALD of TiN Using Aromatic Inhibitor Molecules for...
Just making sure that you have not missed this important and amazing publication from Merkx et al at TU Eindhoven since I missed it for more than a month by now. Selective ALD of TiN - woah so...
View ArticleSALD deposits trust in new advisory board chaired by Prof. Kessels
Spatial atomic layer deposition equipment manufacturer SALD has set up an advisory board, which, apart from acting as a sounding board to management, will also have an ambassadorial function The...
View ArticleHafnium (IV) oxide obtained by atomic layer deposition (ALD) technology...
ALD HfO2 is very versatile, first, it saved the whole semiconductor industry (HKMG Technology) and now it has been shown that an ALD HfO2 layer can be applied to cover the surface of metallic...
View ArticleLam Research launch the advanced Striker® FE platform for 3D chip...
Lam has been leading gap fill for a long time and their new proprietary surface modification technique (ICEFill) to achieve highly preferential bottom-up and void-free gapfill while retaining the film...
View ArticleEnabling Next-Generation Power Devices and ALD
Wednesday, October 7, 20204:00 PM – 5:00 PM CET Save Your Seat If you can't attend the live session, register for access to a recording for later viewing. Join this free webinar to learn more...
View ArticleSemiconductor Materials Market to Hit $50B in 2020 Up 3% Winds Reverse on the...
September 21, 2020: TECHCET announces that 2020 global materials revenues in semiconductor fabrication are now forecasted upward year-over-year (YoY) despite potential disruptions to manufacturing:...
View ArticleALD Stories - the untold stories of atomic layer deposition and the people...
Beneq launch ALD Podcast - Welcome to ALD Stories, a series of conversations where we share the untold stories of atomic layer deposition and the people behind the technology.In the first episode, we...
View ArticleReverse Engineering by der8auer - Intel 14nm and AMD/TSMC 7nm transistors...
Overclocking expert der8auer examined an Intel Core i7-8700K under a scanning electron microscope (SEM) a couple of years ago when that processor was one of Intel's best consumer offerings. This was an...
View ArticlePicosun’s ALD technology boosts UVC LED performance
In order to reach maximum light output and long operating lifetime, LED chips require surface passivation to eliminate parasitic currents caused by traps and defects ALD passivation layer could...
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