EURIS announces launch of new Arradiance GEMStar Quantum ALD System in Europe
Euris is proud to announce the launch of the GEMStar QuantumTM, the latest generation of Atomic Layer Deposition system targeted for demanding applications requiring more precise control. Maintaining...
View ArticleASM’S Korean partner receives US$4.5 million grant from Korean government for...
The Korean Government has awarded US$4.5 million in grants to ASM’s Korean R&D partner Zirconium Technology Corporation (ZironTech) to use to progress its commitment to the Joint Venture (JV) with...
View ArticleImproved crystalline quality of Plasma ALD GaN ising plasma surface pretreatment
Semiconductor Today reports that Researchers based in China and the USA have improved the crystal quality of gallium nitride (GaN) thin films on sapphire from a 350°C low-temperature plasma-enhanced...
View ArticleChemistry paves the way for improved electronic materials - LiU have...
Indium nitride is a promising material for use in electronics, but difficult to manufacture. Scientists at LiU have developed a new molecule that can be used to create high-quality indium nitride,...
View ArticleAVS ALD 2020 starts today and RASIRC is presenting and contributing with the...
RASIRC is contributing to two oral and two poster presentations at the AVS ALD2020 Virtual conference starting today. The results summarize the latest development using either peroxide (H2O2) or...
View ArticleJVSTA 2019 Best ALD Paper Award Winner
As announced today at the Virtual AVS ALD Conference by Prof. Kessels - Congratulations to the winner of the 2019 Best ALD Paper Award, selected from papers presented at the 19th International...
View ArticleAVS 2020 International Twitter Poster Competition
The American Vacuum Society (AVS) is excited to announce the AVS 2020 International Twitter Poster Competition, a new online venue to share your research with a global audience. We hope you will join...
View ArticleSave the date - AVS ALD & ALE 2021 June 27-30, 2021, Tampa, Florida
Save the DateJune 27-30, 2021, Tampa, FloridaThe AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be...
View ArticleNew ALD chemistry for ultra-thin gas sensors
[Phys.org LINK] The application of zinc oxide layers in industry is manifold and ranges from the protection of degradable goods to the detection of toxic nitrogen oxide gas. Such layers can be...
View ArticleALD Hafnium oxide as an enabler for competitive ferroelectric devices
Here is a new paper from NaMLab on ferroelectric hafnium oxide applications entitled "Hafnium oxide as an enabler for competitive ferroelectric devices"Ferroelectric materials offer the promise to...
View ArticleSamsung Leads Semiconductor Paradigm Shift with New Material Discovery :...
[Samsung Newsroom, LINK] Researchers at the Samsung Advanced Institute of Technology (SAIT) have unveiled the discovery of a new material, called amorphous boron nitride (a-BN), in collaboration with...
View Article5th Annual CMC Conference, October 21-22, 2020
Worldwide Web Event on Critical Materials5th Annual Event Will Happen in "Virtual Space" Just announced - The Critical Materials Council (CMC) Conference Committee is taking the 5th annual CMC...
View ArticleVirtual AVS ALD/ALE 2020 confernce summary
Here is a summary of the Virtual AVS ALD/ALE 2020 conference and BALD Engineering participation and Social Events during the confernece. For continued access to the presentations please see the AVS...
View ArticleAtomic Layer Etch Expands To New Markets - AVS ALE2020 report
Mark Lapedus reports in SemiEngineering that is expanding to new markets as presented at the recent AVS ALE2020 Virtual conference.At the conference companies, R&D organizations and universities...
View ArticleSales to 300 mm wafer market boosts Picosun to new record in Q2/2020
ESPOO, Finland, 28th July 2020 – Picosun Group, leading supplier of AGILE ALD® (Atomic Layer Deposition) thin film coating equipment and solutions, reports record sales during the second quarter of...
View ArticleBDEAS - a versaitile ALD precursor for high quality dilectric films in...
One of the most important reasons why Silicon (Si), in place of Germanium (Ge), was propelled to the front of the class in the semiconductor industry from the very beginning, is the fact that Si forms...
View ArticleApplied Materials launch Selective Tungsten CVD for their Endura(TM) platform
[Applied Materials Blog LINK] Tungsten has been widely used as a gapfill material in middle-of-line (MOL) contacts for its low resistivity and bulk fill characteristics. MOL contacts form the critical...
View ArticleTechInsights ALD/ALE Process in Commercially Available Logic Devices
2018 saw the introduction of a new generation of logic products featuring finFET transistors headlined by Intel with their 10 nm generation microprocessor, followed by TSMC and Samsung towards the end...
View ArticleNano-Engineered Surfaces Unlock New Material Capabilities
Forge Nano launches new tools to enable nano-tech research, using Atomic Layer DepositionPutting recent investments to work, Forge Nano Inc. launches new tool to enable Particle Atomic Layer...
View ArticleEreztech is excited to announce the 2020 BridgeForward™ Award
Ereztech is excited to announce the 2020 BridgeForward™ Award, a financial award recognizing gifted graduate students and recent post-doctoral graduates pursuing careers in organometallic chemistry or...
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