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The dynamics in CVD and PEALD of InN
Epitaxial nanometer-thin indium nitride (InN) films are considered promising active layers in various device applications but remain challenging to deposit. Pedersen's group at Linköping University,...
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Call for Abstracts - 6th Area Selective Deposition Workshop (ASD 2022)
Call for Abstracts, Due February 7, 2022An effort to help facilitate the progression of ASD techniques, the 6th Area Selective Deposition Workshop (ASD 2022) scheduled for April 21-22, 2022, in San...
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Post Doc position in ALE and Steven M. George Lab, Boulder Colorado
Department of Chemistry, University of Colorado, Boulder, CO 80309 We seek a highly-motivated individual for a postdoctoral position, available immediately, to join the laboratory of Prof. Steven...
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Dutch deep tech start-up Delft IMP secures €10 million series A funding to...
Sandwater, a Nordic venture capitalist and Invest-NL have agreed to a €10 million investment in Delft IMP. This allows Delft IMP to accelerate their nanocoating process to industrial scale enabling...
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Nanexa receives orders for ALD coating of sensors for detection of nuclear...
Nanexa AB (www.nanexa.com) recently announced that the company has received two orders for a substantial number of sensors for detection of radioactive isotopes of the noble gas xenon, from two...
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Forge Nano Installs Prometheus™ Powder Atomic Layer Deposition (PALD)...
Forge Nano, a global leader in surface engineering with atomic layer deposition (ALD) sells the top-of-the-line Prometheus™ development system. Air Liquide is using the system to validate applications...
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AlixLabs Granted Patent in Taiwan - The Unmatched Leader of the Global...
TUE, OCT 12, 2021 21:01 CET -- AlixLabs AB today announced that the company has been granted a patent in Taiwan relating to Atomic Layer Etch Pitch Splitting (APS)AlixLabs from Lund, Sweden, has...
View ArticlePicosun ALD move into HVM for Optoelectronics at ams OSRAM
ESPOO, Finland, 28th of July 2021 – Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.ams OSRAM has...
View ArticlePicosun 200 and 300 mm Clustered ALD Batch tools setting a higher pace and...
ESPOO, Finland, 14th of October 2021 – PICOSUN® Morpher has continued to demonstrate excellent batch process results in the latest acceptance runs the company has performed for its customers in the...
View ArticleBenchtop ALD system AT410 from Anric Technologies offered by SPS
SPS offers various ALD systems, including a table top version for surface controlled layer-by-layer deposition with atomic layer accuracy. We are talking about the AT410! This system provides a...
View ArticlePerovskite Solar Cells by ALD with Georgi Popov Helsinki University
Georgi Popov, Helsingfors universitet, med presentationen "Perovskite Solar Cells by Atomic Layer Deposition (ALD)", del 2/8 i videoserien ”STV 100 år – fokus på energi” där unga forskare från olika...
View ArticleGreen CVD: How Sustainable is Thin Film Deposition?
Professors Henrik Pedersen, Sean Barry, and Jonas Sundqvist join Tyler to discuss their recent publication in JVSTA about Green CVD. The trio talk about the conception of a new research field which...
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Nanofabrication via Maskless Localized Atomic Layer Deposition of Patterned...
Here is a cool demonstration of direct write Spatial ALD or LOCALD like the researches at Laboratoire des Multimatériaux et Interfaces, University of Lyon is calling it.Nanofabrication via Maskless...
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UNIST has set a new efficiency record for a perovskite solar cell (PSC) at 25.8%
[UNIST] A research team, led by Professor Sang Il Seok in the School of Energy and Chemical Engineering at UNIST has set a new efficiency record for a perovskite solar cell (PSC) at 25.8% by forming an...
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ALD Webinar on Coatings for Electronic Implants
Tune into Picosun's webinar on Thursday 16th December 2021, 4PM CET, to discuss the benefits of ALD compared to the conventional coating methods used in electronical implants! LINK: ALD – the perfect...
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Innovative remote plasma source for atomic layer deposition for GaN devices
Oxford Instruments and TU Eindhoven present results from the new Atomfab(TM) Remote Plasma ALD system for high-quality dielectric films. This could enable GaN normally off high-electron-mobility...
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NCD Supplied new ALD equipment for protective coating of semiconductor...
NCD supplied new ALD equipment to the customer based in Korea for coating products used in semiconductor equipment to protect from corrosion and plasma arcing. The customer could expect longer part...
View ArticleAlixLabs, Breaking through the Crisis – Startups
While the world is dealing with the semiconductor shortage, startups are gearing up to fill in the gap with their innovative offerings to ensure that crisis doesn’t last long. In this interview, the...
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2021 November Networking - ALD at Aalto University
Date and time: Fri 26.11.2021 starting at 13 Event will be held at Aalto CHEM, Kemistintie 1, Espoo and online in Zoom at https://aalto.zoom.us/j/68826769819 (password to be sent to registered...
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