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Call for abstracts - AVS 22nd International Conference on Atomic Layer...

 Call for AbstractsDue February 3, 2022Review Topics & Submit AbstractThe AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer...

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How Did Plasmas Change ALD? - w/ Erwin Kessels (ALD Stories Ep 8)

In Episode 8 of ALD Stories, Tyler chats with Eindhoven University of Technology professor, Erwin Kessels, about plasma-enhanced ALD, industry applications, and Erwin's Atomic Limits blog &...

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Picosun Group has launched an ALD Medical Materials Library

Picosun Group has launched a Medical Materials Library consisting of over ten materials intended for medical-related coating and encapsulation with ALD."Picosun’s Medical Materials Library targeted to...

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Watch again - Material development for MRAM and FRAM stacks at Fraunhofer...

Material development for MRAM and FRAM stacksDr. Lukas Gerlich & Konrad Seidel (Fraunhofer IPMS - Center Nanoelectronic Technologies)Today, data is the lifeblood disrupting many industries. The...

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Webinar RIE and ALE Processes for Quantum Devices

Optimise the Fabrication Process for Quantum Devices, 2nd December, 4 pm (GMT)Dr Russ Renzas, Quantum Technology Market ManagerThe fabrication of superconducting qubits, quantum photonic elements and...

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Master Program in ALD at Helsinki University!

On de­mand tailored train­ing  We can organise special training on ALD and thin film characterisation. The content can be specifically tailored to meet your specific needs. Contact for further...

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Beneq unveils two new ALD products for 300mm and compound semiconductor...

Beneq revolutionized ALD cluster tools for More-than-Moore device makers with the highly successful Beneq Transform® family of products. Today, Beneq broadens its product portfolio further with two new...

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How Machine Learning Enables Accurate Prediction of Precursor Volatility

by Simon Elliott, Director of Atomic Level Process Simulation, SchrödingerChallenges in predicting volatilityA crucial process in manufacturing CPUs and other high-tech devices is the deposition of...

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Meaglow Hollow Cathode Gas Plasma Source Paper Published by the Journal...

Meaglow technical staff have published a paper entitled: “Recent Advances in Hollow Cathode Technology for Plasma-Enhanced ALD — Plasma Surface Modifications for Aluminum and Stainless-Steel Cathodes”...

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2022 Atomic Layer Processing Modelling Workshop

Pedersen group is organizing a work shop on modelling of atomic layer processes in Linköping 15-16 March next year with a Tutorial by Ray Adomaitis. Possibility to join via Zoom. Webpage:...

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Redstone’s North Karelia Growth Fund makes a pre-seed investment in...

Redstone’s North Karelia Growth Fund makes a pre-seed investment in Chipmetrics, a spin-off of VTT. Chipmetrics is based in Joensuu, Finland, one of the leading photonics hubs in Europe. The company is...

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Interview with Maksym Plakhotnyuk, CEO & Co-Founder, Atlanta 3D Nanosystems

Here an insightful interview with Maksym Plakhotnyuk, CEO & Co-Founder, Atlanta 3D Nanosystems on Advancements in Micro & Nano Electronics – What it Means for the Semiconductor IndustryATLANT...

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TSMC Self-Aligned Via Process Development for Beyond the 3nm Node

Semiwiki Tom Dillinger reports on an interesting paper by TSMC at the recent IEDM 2021 conference in San Francisco using selective ALD with the help of SAMs or Dielectric on Dielectric (DOD) as it is...

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Picosun part of extensive quantum technology 10 Million Euro QuTI project is...

ESPOO, Finland, 18th of January 2022– Picosun takes part as an industrial partner in QuTI, a recently launched extensive research project aiming to develop new components, manufacturing and testing...

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BENEQ gives insights to the growing USD 345 Million More than Moore market...

Here is an insightful interview with Patrick Rabinzohn, Ph.D., VP of the Semiconductor ALD Business Unit at Beneq regarding ALD in the More than Moore market (MtM) LINK. Yole Development recently...

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AVS Seminar Atomic Layer Deposition from an Applications Perspective by Prof....

 Coming up soon - AVS Seminar Atomic Layer Deposition from an Applications Perspective by Prof. Kessels, TU Eindhoven.Read about the background at AtomicLimits LINK.Atomic Layer Deposition from an...

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ALD InGaN with single precursor pulse of In & Ga

Polla Rouf of Pedersen Group in Linköping Sweden, just published an ALD approach to metastable In1−xGaxN with 0.1 < x < 0.5 based on solid In- and Ga-precursors that were co-sublimed into the...

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AtomicLimits: Atomic Layer Etch Carves the Path to More Efficient Computing

Here is a good blog post by Intermolecular at atomic Limits on advances in ALE and future prospectsHigh-volume manufacturing (HVM) of atomic-scale semiconductor devices requires new approaches to...

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Abstract submission - Atomic Layer Processing Modelling Workshop 15-16 March...

The abstract submission and registration for our Atomic Layer Processing Modelling Workshop 15-16 March is now open at the conference website 2022 Atomic Layer Processing Modelling Workshop - Linköping...

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Picosun and Shincron join forces for ALD optical coating development

ESPOO, Finland, 3rd of February 2022 – Picosun Group and Shincron Co., Ltd. have joined forces for development and commercialization of Atomic Layer Deposition (ALD) for optical coatings. ALD...

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